Volume 26, Issue 19
Preparative Inorganic Chemistry
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ChemInform Abstract: Cathodic Deposition of Ternary In + As + Sb Alloys and Formation of InAsxSb1-x.

S. CATTARIN

S. CATTARIN

IPELP, CNR, I-35020 Padova, Italy

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M. M. MUSIANI

M. M. MUSIANI

IPELP, CNR, I-35020 Padova, Italy

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U. CASELLATO

U. CASELLATO

IPELP, CNR, I-35020 Padova, Italy

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P. GUERRIERO

P. GUERRIERO

IPELP, CNR, I-35020 Padova, Italy

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R. BERTONCELLO

R. BERTONCELLO

IPELP, CNR, I-35020 Padova, Italy

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First published: May 9, 1995

Abstract

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ChemInform Abstract

Homogeneous In + As + Sb alloys suitable for achieving InAsxSb1-x are deposited onto Ni and Ti cathodes from tartaric acid electrolyte solutions of pH 2. The As to Sb ratio can be controlled by the solution composition and the deposition potential. The In content of the deposits increases and the As content decreases with decreasing deposition potential. As shown by XPS and XRD analysis, the formation of III-V compounds occurs at room temp. and In preferentially reacts with As rather than with Sb. The selectivity in favor of As increases by annealing of the samples at 250 and 450 °C. After annealing of the In + As + Sb alloys at 250 °C the entire deposit seems to be converted into crystalline InAsxSb1-x.

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