Volume 123, Issue 5 pp. 3028-3035

Frequency response analysis of nonisothermal film blowing process using transient simulations

Hyung Min Kim

Hyung Min Kim

Department of Chemical and Biological Engineering, Korea University, Seoul 136-713, Korea

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Joo Sung Lee

Joo Sung Lee

Battery R&D, LG Chem/Research Park, Daejeon 305-380, Korea

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Hyun Wook Jung

Corresponding Author

Hyun Wook Jung

Department of Chemical and Biological Engineering, Korea University, Seoul 136-713, Korea

Department of Chemical and Biological Engineering, Korea University, Seoul 136-713, Korea===Search for more papers by this author
Jae Chun Hyun

Jae Chun Hyun

Department of Chemical and Biological Engineering, Korea University, Seoul 136-713, Korea

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First published: 01 September 2011

Abstract

Frequency response of the nonisothermal viscoelastic film blowing process to the ongoing sinusoidal disturbances has been investigated using transient simulation techniques. Of the many state variables exhibiting resonant peaks with the input frequency, amplitude ratio of the film cross-sectional area at the freezeline height has been used as an indicator of the process sensitivity. The effects of operating conditions and viscoelasticity on the sensitivity have been scrutinized around the middle point of three multiple steady states under the given conditions. The sensitivity results have been interpreted through their correlation with results from linear stability analysis. Increasing draw ratio generally makes the system more sensitive to sinusoidal disturbances, whereas the cooling induces more sensitive or less sensitive system, according to the location of a steady state. Also, the viscoelasticity makes the system of extensional thickening fluids more sensitive at low Deborah number and less sensitive at high Deborah number. © 2011 Wiley Periodicals, Inc. J Appl Polym Sci, 2012

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