Volume 37, Issue 6 pp. 1589-1593
Article
Full Access

X-ray-induced reactions and resist features of polydibutylgermane

Hiroshi Ban

Hiroshi Ban

NTT LSI Laboratories, Morinosato Wakarniya, Atsugi, Kanagawa, 243-01, Japan

Search for more papers by this author
Kimiyoshi Deguchi

Kimiyoshi Deguchi

NTT LSI Laboratories, Morinosato Wakarniya, Atsugi, Kanagawa, 243-01, Japan

Search for more papers by this author
Akinobu Tanaka

Akinobu Tanaka

NTT LSI Laboratories, Morinosato Wakarniya, Atsugi, Kanagawa, 243-01, Japan

Search for more papers by this author
First published: 20 February 1989
Citations: 7

Abstract

Polydibutylgermane undergoes oxidation reaction and chain scission under X-ray exposure. These reactions are the same as those observed for ultraviolet irradiation. Positive resist patterns can be fabricated by X-ray lithography.

The full text of this article hosted at iucr.org is unavailable due to technical difficulties.