Electron-sensitive resists. II. Positive resists derived from high polymers of methyl methacrylate, methyl α-chloroacrylate, and hexyl methacrylate

This paper reports the synthesis, characterization, and evaluation of copolymers of methyl methacrylate (MMA) and hexyl methacrylate (HMA) and of HMA and methyl α-chloroacrylate (MCA) and of terpolymers of MMA, MCA, and HMA as electron-sensitive positive resists. The sensitivities of the resists were found to be strongly dependent on the composition. Two of the terpolymers were found to be significantly more sensitive than poly(methyl methacrylate) (PMMA).