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Stable Deacon Process for HCl Oxidation over RuO₂^†

Daniela Crihan

Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Heinrich-Buff-Ring 58, 35392 Gießen, Germany, Fax: (+49) 641-99-34559 http://www.uni-giessen.de/pci/Homepage_Over

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Marcus Knapp Dr.,

Marcus Knapp Dr.

Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Heinrich-Buff-Ring 58, 35392 Gießen, Germany, Fax: (+49) 641-99-34559 http://www.uni-giessen.de/pci/Homepage_Over

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Stefan Zweidinger,

Stefan Zweidinger

Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Heinrich-Buff-Ring 58, 35392 Gießen, Germany, Fax: (+49) 641-99-34559 http://www.uni-giessen.de/pci/Homepage_Over

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Edvin Lundgren Dr.,

Edvin Lundgren Dr.

Department of Synchrotron Radiation Research, University of Lund, Sölvegatan 14, 22362 Lund, Sweden

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Cornelis J. Weststrate Dr.,

Cornelis J. Weststrate Dr.

Department of Synchrotron Radiation Research, University of Lund, Sölvegatan 14, 22362 Lund, Sweden

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Jesper N. Andersen Prof. Dr.,

Jesper N. Andersen Prof. Dr.

Department of Synchrotron Radiation Research, University of Lund, Sölvegatan 14, 22362 Lund, Sweden

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Ari P. Seitsonen Dr.,

Ari P. Seitsonen Dr.

IMPC, CNRS & Université Pierre et Marie Curie, 4 place Jussieu, case 115, 75252 Paris, France

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Herbert Over Prof. Dr.,

Herbert Over Prof. Dr.

[email protected]

Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Heinrich-Buff-Ring 58, 35392 Gießen, Germany, Fax: (+49) 641-99-34559 http://www.uni-giessen.de/pci/Homepage_Over

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Daniela Crihan,

Daniela Crihan

Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Heinrich-Buff-Ring 58, 35392 Gießen, Germany, Fax: (+49) 641-99-34559 http://www.uni-giessen.de/pci/Homepage_Over

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Marcus Knapp Dr.,

Marcus Knapp Dr.

Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Heinrich-Buff-Ring 58, 35392 Gießen, Germany, Fax: (+49) 641-99-34559 http://www.uni-giessen.de/pci/Homepage_Over

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Stefan Zweidinger,

Stefan Zweidinger

Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Heinrich-Buff-Ring 58, 35392 Gießen, Germany, Fax: (+49) 641-99-34559 http://www.uni-giessen.de/pci/Homepage_Over

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Edvin Lundgren Dr.,

Edvin Lundgren Dr.

Department of Synchrotron Radiation Research, University of Lund, Sölvegatan 14, 22362 Lund, Sweden

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Cornelis J. Weststrate Dr.,

Cornelis J. Weststrate Dr.

Department of Synchrotron Radiation Research, University of Lund, Sölvegatan 14, 22362 Lund, Sweden

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Jesper N. Andersen Prof. Dr.,

Jesper N. Andersen Prof. Dr.

Department of Synchrotron Radiation Research, University of Lund, Sölvegatan 14, 22362 Lund, Sweden

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Ari P. Seitsonen Dr.,

Ari P. Seitsonen Dr.

IMPC, CNRS & Université Pierre et Marie Curie, 4 place Jussieu, case 115, 75252 Paris, France

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Herbert Over Prof. Dr.,

Herbert Over Prof. Dr.

[email protected]

Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Heinrich-Buff-Ring 58, 35392 Gießen, Germany, Fax: (+49) 641-99-34559 http://www.uni-giessen.de/pci/Homepage_Over

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First published: 22 February 2008

https://doi.org/10.1002/anie.200705124

Citations: 128

^†

H.O. acknowledges the DFG for financial support (Ov21/7) and the Leibniz-Rechenzentrum in Munich for providing us with parallel computing time. E.L. and J.N.A. thank for financial support by the Swedish Research Council. C.J.W. thanks for financial support from the Netherlands Organisation for Scientific research through the Rubicon program.

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Graphical Abstract

Selective substitution: In the oxidation of HCl with oxygen to give Cl₂ and water, RuO₂(110) serves as a stable, active model catalyst for the Sumitomo process (see picture; Ru in red and blue). The stability of the catalyst is related to the selective replacement of undercoordinated bridging surface O atoms (O_br) by Cl atoms (Cl_br). The chlorination of RuO₂(110) is self-limiting, in that chlorine incorporation terminates when all bridging O atoms are replaced.

Supporting Information

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Volume47, Issue11

February 28, 2008

Pages 2131-2134

Stable Deacon Process for HCl Oxidation over RuO₂^†

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Stable Deacon Process for HCl Oxidation over RuO₂^†