Original Paper
Advances of pulsed laser deposition of ZnO thin films
First published: 10 February 2004
Abstract
Advances in Pulsed Laser Deposition (PLD) equipment and process design for the epitaxy of ZnO thin films on a-, and c-oriented sapphire substrates are reported. The achieved improvement of device relevant ZnO layer properties is directly related to our equipment design and novel process schemes. First results on growth and reflectivity of ZnO-MgO based dielectric Bragg resonators for future ZnO-based light emitter devices are shown.
