Photophysics and Photochemistry of Ultrafast Laser Materials Processing
Summary
This chapter contains sections titled:
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Introduction and Motivation
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Ultrafast Laser Materials Interactions: Electronic Excitation
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Metals: The Two-temperature Model
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Semiconductors
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Ultrafast Laser-induced Melting in Semiconductors
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Ultrafast Laser Ablation in Semiconductors
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Theoretical Studies of Femtosecond Laser Interactions with Semiconductors
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Insulators
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Ultrafast Ablation of Insulators
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Self-focusing of Ultrashort Pulses for Three-dimensional Structures
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Color-center Formation by Femtosecond Laser Irradiation
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Ultrafast Laser-materials Interaction: Vibrational Excitation
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Ablation of Inorganic Materials by Resonant Vibrational Excitation
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Ablation of Organic Materials by Resonant Vibrational Excitation
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Photochemistry in Femtosecond Laser-materials Interactions
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Sulfidation of Silicon Nanostructures by Femtosecond Irradiation
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Nitridation of Metal Surfaces Using Picosecond MIR Radiation
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Photomechanical Effects at Femtosecond Timescales
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Shock Waves, Phase Transitions and Tribology
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Coherent Phonon Excitations in Metals
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Ultrafast Laser-induced Forward Transfer (LIFT)
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Pulsed Laser Deposition
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Near-infrared Pulsed Laser Deposition
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Infrared Pulsed Laser Deposition of Organic Materials on Micro- and Nanostructures
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Future Trends in Ultrafast Laser Micromachining
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Ultrashort-pulse Materials Modification at High Pulse-repetition Frequency
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Pulsed Laser Deposition at High Pulse-repetition Frequency
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Deposition of Inorganic Thin Films
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Deposition of Organic Thin Films
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Picosecond Processing of Carbon Nanotubes
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Sub-micron Parallel-process Patterning of Materials with Ultraviolet Lasers
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Summary and Conclusions