Research Article
Preparation of Nd2O3 Thin Films by a Novel Sol–Gel Dipping Process
First published: 16 November 2001
Citations: 3
Abstract
A novel sol–gel dipping process is adopted to prepare Nd2O3 thin films with Nd(NO3)3 · 6H2O as precursor and collodion as viscosity-increasing agent. The annealing temperature of gel films is 600 °C and the thickness of Nd2O3 thin films increases linearly with the number of dippings at a rate of about 20 nm per dipping. This novel dip-coating process provides a good reproducibility of the homogeneous Nd2O3 thin films. The function of collodion is discussed. The spectral and crystal properties of the thin films are studied and the results indicate that the color of the thin films mainly results from interference.
