Photolithography

Kevin D. Lucas

Kevin D. Lucas

Motorola Advanced Process Development and External Research Laboratory

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Clifford L. Henderson

Clifford L. Henderson

Georgia Institute of Technology

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Andrzej J. Strojwas

Andrzej J. Strojwas

Carnegie Mellon University, Austin, TX

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First published: 27 December 1999

Abstract

The sections in this article are

  • 1 Overview of Optical Lithography
  • 2 Patterning Issues
  • 3 Optical Lithography Extensions
  • 4 Successors to Optical Lithography
  • 5 Conclusion
  • 6 Acknowledgments

The full text of this article hosted at iucr.org is unavailable due to technical difficulties.