Zhejiang Agr & For University

Zhejiang Agr & For University

Search term
Advanced Search Citation Search
Search term
Advanced Search Citation Search

physica status solidi c

Volume 9, Issue 3-4 pp. 631-634

ICNS-9 – Contributed Article

Fabrication and properties of etched GaN nanorods

Philip Shields,

Corresponding Author

Philip Shields

[email protected]

Department of Electronic and Electrical Engineering, University of Bath, Bath, BA2 7AY, UK

Phone: +00 44 1225 386063, Fax: +00 44 1225 386305Search for more papers by this author

Maxime Hugues

CRHEA-CNRS, Rue Bernard Grégory, 06560 Valbonne, France

Search for more papers by this author

Jesus Zúñiga-Pérez,

Jesus Zúñiga-Pérez

CRHEA-CNRS, Rue Bernard Grégory, 06560 Valbonne, France

Search for more papers by this author

Mike Cooke

Oxford Instruments Plasma Technology, North End, Yatton, Bristol BS49 4AP, UK

Search for more papers by this author

Mark Dineen

Oxford Instruments Plasma Technology, North End, Yatton, Bristol BS49 4AP, UK

Search for more papers by this author

Wang Wang

Department of Electronic and Electrical Engineering, University of Bath, Bath, BA2 7AY, UK

Search for more papers by this author

Federica Causa,

Federica Causa

Department of Electronic and Electrical Engineering, University of Bath, Bath, BA2 7AY, UK

Search for more papers by this author

Duncan Allsopp,

Duncan Allsopp

Department of Electronic and Electrical Engineering, University of Bath, Bath, BA2 7AY, UK

Search for more papers by this author

Philip Shields,

Corresponding Author

Philip Shields

[email protected]

Department of Electronic and Electrical Engineering, University of Bath, Bath, BA2 7AY, UK

Phone: +00 44 1225 386063, Fax: +00 44 1225 386305Search for more papers by this author

Maxime Hugues

CRHEA-CNRS, Rue Bernard Grégory, 06560 Valbonne, France

Search for more papers by this author

Jesus Zúñiga-Pérez,

Jesus Zúñiga-Pérez

CRHEA-CNRS, Rue Bernard Grégory, 06560 Valbonne, France

Search for more papers by this author

Mike Cooke

Oxford Instruments Plasma Technology, North End, Yatton, Bristol BS49 4AP, UK

Search for more papers by this author

Mark Dineen

Oxford Instruments Plasma Technology, North End, Yatton, Bristol BS49 4AP, UK

Search for more papers by this author

Wang Wang

Department of Electronic and Electrical Engineering, University of Bath, Bath, BA2 7AY, UK

Search for more papers by this author

Federica Causa,

Federica Causa

Department of Electronic and Electrical Engineering, University of Bath, Bath, BA2 7AY, UK

Search for more papers by this author

Duncan Allsopp,

Duncan Allsopp

Department of Electronic and Electrical Engineering, University of Bath, Bath, BA2 7AY, UK

Search for more papers by this author

First published: 21 November 2011

https://doi.org/10.1002/pssc.201100394

Citations: 30

Share a link

Email
Wechat
Bluesky

Abstract

Gallium nitride nanorod arrays have been created via dry etching in Cl₂/Ar plasma using a Ni mask formed by nanoimprint lithography and lift-off. Aspect ratios greater than 20 are demonstrated by optimizing the etch conditions to achieve near-vertical sidewalls. Such top-down etched nanorod arrays have greater uniformity when compared to bottom-up arrays, with the process already having been demonstrated on 4-inch wafers. (© 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

Citing Literature

Volume9, Issue3-4

Special Issue:9th International Conference on Nitride Semiconductors (ICNS‐9); see further papers in Phys. Status Solidi B 249, No. 3 (2012) and Phys. Status Solidi A 209, No. 3 (2012) • E‐MRS 2011 Spring Meeting – Symposium H; see further papers in Phys. Status Solidi A 209, No. 1 (2012) • E‐MRS 2011 Spring Meeting – Symposium F; see further papers in Phys. Status Solidi RRL 6, No. 2 (2012) and Phys. Status Solidi B 249, No. 3 (2012)

March 2012

Pages 631-634

The full text of this article hosted at iucr.org is unavailable due to technical difficulties.