Volume 5, Issue 6 pp. 1699-1701
Contributed Article

In-situ measurement of the strain relaxation of GaN nanograins during X-ray irradiation

Hyeokmin Choe

Hyeokmin Choe

Department of Physics and Research Institute for Basic Sciences, Kyunghee University, 1 Hoegi-dong, Dongdaemun-gu, Seoul 130-701, Korea

Search for more papers by this author
Sanghwa Lee

Sanghwa Lee

Department of Physics and Research Institute for Basic Sciences, Kyunghee University, 1 Hoegi-dong, Dongdaemun-gu, Seoul 130-701, Korea

Search for more papers by this author
Yuri Sohn

Yuri Sohn

Department of Physics and Research Institute for Basic Sciences, Kyunghee University, 1 Hoegi-dong, Dongdaemun-gu, Seoul 130-701, Korea

Search for more papers by this author
Chinkyo Kim

Corresponding Author

Chinkyo Kim

Department of Physics and Research Institute for Basic Sciences, Kyunghee University, 1 Hoegi-dong, Dongdaemun-gu, Seoul 130-701, Korea

Phone: +82-2-961-0379, Fax: +82-2-957-8408Search for more papers by this author
First published: 13 May 2008
Citations: 1

Abstract

GaN nanograins were grown on a c-plane sapphire substrate and their strain relaxation due to x-ray irradiation was investigated in-situ by utilizing synchrotron xray scattering. The GaN nanograins were constantly exposed to the synchrotron X-ray and θ -2θ scans through the (002) Bragg peak of GaN were repeatedly carried out during the irradiation.

The Bragg peak of the compressively strained GaN nanograins gradually shifted toward higher angle, which implies that the GaN nanograins in compressive strain experienced strain relaxation during x-ray irradiation. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

The full text of this article hosted at iucr.org is unavailable due to technical difficulties.