Structure and electrical properties of thermally evaporated neodymium oxide thin films are studied. From the XRD technique the structure of the deposited film (265 nm) is found to be of crystalline nature. However, films of lower thicknesses are found to possess amorphous structure. The loss peak minimum (tan δ_min), observed in the frequency-loss factor plot, is found to shift to the lower frequency region as the number of annealing cycles increases and the results are discussed. The ac conduction property of these films with aluminium electrodes forming a MIM sandwich structure is studied at different frequencies and temperatures. Two activation energies for the conduction process are also estimated and the results are discussed.

Abstract

Die Struktur und die elektrischen Eigenschaften von thermisch aufgebrachten, dünnen Neodymoxid-schichten werden untersucht. Mit der XRD-Methode wird festgestellt, daß die Struktur der au-gebrachten Schichten (265 nm) kristallin ist. Es wird jedoch gefunden, daß das Minimum des Verlustfaktors (tg δ_min). das in der Frequenz- Verlustfaktordarstellung bcobachtet wird, sich zum Bereich niedriger Frequenzen verschiebt. wenn die Zahl der Temperungszyklen vergröBert wird, und die Ergebnisse werden diskutiert. Bei unterschiedlichen Frequenzen und Temperaturen werden die _ Wechselstromleitungseigenschaften dieser Schichten mit Aluminiumelektroden, die eine MIM-Sand-wichstruktur bilden, untersucht. Für den Leitungsprozeß werden zwei Aktivierungsenergien berechnet und die Ergebnisse diskutiert.

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Volume128, Issue2

16 December 1991

Pages 427-433

Structure and Electrical Properties of Thermally Evaporated Nd₂O₃ Thin Films

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Structure and Electrical Properties of Thermally Evaporated Nd₂O₃ Thin Films