Volume 217, Issue 3 1900675
Feature Article

Molecular Beam Epitaxy of Transition Metal Nitrides for Superconducting Device Applications

D. Scott Katzer

Corresponding Author

D. Scott Katzer

Electronics Science and Technology Division, U. S. Naval Research Laboratory, 4555 Overlook Avenue, S.W., Washington, DC, 20375-5347 USA

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Neeraj Nepal

Neeraj Nepal

Electronics Science and Technology Division, U. S. Naval Research Laboratory, 4555 Overlook Avenue, S.W., Washington, DC, 20375-5347 USA

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Matthew T. Hardy

Matthew T. Hardy

Electronics Science and Technology Division, U. S. Naval Research Laboratory, 4555 Overlook Avenue, S.W., Washington, DC, 20375-5347 USA

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Brian P. Downey

Brian P. Downey

Electronics Science and Technology Division, U. S. Naval Research Laboratory, 4555 Overlook Avenue, S.W., Washington, DC, 20375-5347 USA

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David F. Storm

David F. Storm

Electronics Science and Technology Division, U. S. Naval Research Laboratory, 4555 Overlook Avenue, S.W., Washington, DC, 20375-5347 USA

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Eric N. Jin

Eric N. Jin

NRC Research Associateships Programs, 500 Fifth Street, Washington, DC, 20001 USA

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Rusen Yan

Rusen Yan

School of Electrical and Computer Engineering, Cornell University, Ithaca, NY, 14853 USA

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Guru Khalsa

Guru Khalsa

Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853 USA

School of Applied and Engineering Physics, Cornell University, Ithaca, NY, 14853 USA

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John Wright

John Wright

Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853 USA

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Andrew C. Lang

Andrew C. Lang

American Society for Engineering Education, Projects Office, 1818 N. Street, Suite 600, Washington, DC, 20036 USA

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Tyler A. Growden

Tyler A. Growden

NRC Research Associateships Programs, 500 Fifth Street, Washington, DC, 20001 USA

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Vikrant Gokhale

Vikrant Gokhale

NRC Research Associateships Programs, 500 Fifth Street, Washington, DC, 20001 USA

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Virginia D. Wheeler

Virginia D. Wheeler

Electronics Science and Technology Division, U. S. Naval Research Laboratory, 4555 Overlook Avenue, S.W., Washington, DC, 20375-5347 USA

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Alan R. Kramer

Alan R. Kramer

NRC Research Associateships Programs, 500 Fifth Street, Washington, DC, 20001 USA

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Joan E. Yater

Joan E. Yater

Electronics Science and Technology Division, U. S. Naval Research Laboratory, 4555 Overlook Avenue, S.W., Washington, DC, 20375-5347 USA

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Huili Grace Xing

Huili Grace Xing

School of Electrical and Computer Engineering, Cornell University, Ithaca, NY, 14853 USA

Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853 USA

Kavli Institute at Cornell for Nanoscale Science, Cornell University, Ithaca, NY, 14853 USA

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Debdeep Jena

Debdeep Jena

School of Electrical and Computer Engineering, Cornell University, Ithaca, NY, 14853 USA

Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853 USA

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David J. Meyer

David J. Meyer

Electronics Science and Technology Division, U. S. Naval Research Laboratory, 4555 Overlook Avenue, S.W., Washington, DC, 20375-5347 USA

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First published: 12 October 2019
Citations: 22

Abstract

Epitaxial integration of superconductors with semiconductors is expected to enable new device architectures and to increase electronic circuit and system functionality and performance in diverse fields, including sensing and quantum computing. Herein, radiofrequency plasma molecular-beam epitaxy is used to epitaxially grow 3–200 nm-thick metallic NbNx and TaNx thin films on hexagonal SiC substrates. Single-phase cubic δ-NbN and hexagonal TaNx films are obtained when the starting substrate temperature is ≈800 and ≈900 °C, respectively, and the active N to Nb or Ta ratio is ≈2.5–3. The films are characterized using in-situ reflection high-energy electron diffraction and ex-situ atomic force microscopy, contactless sheet resistance, X-ray diffraction, X-ray photoelectron spectroscopy, secondary ion-mass spectrometry, Rutherford backscattering spectrometry, cross-sectional transmission electron microscopy, and low-temperature electrical measurements. Smooth, epitaxial, low-resistivity films of cubic δ-NbN and hexagonal TaNx on SiC are demonstrated for films at least ≈50 nm-thick, and their superconducting properties are reported. Epitaxy of AlN and GaN on δ-NbN is also demonstrated, as well as integration of an epitaxial NbNx superconducting electrode layer under GaN high-electron mobility transistors. These early demonstrations show the promise of direct epitaxial integration of superconducting transition metal nitrides with group III-N semiconductors.

Conflict of Interest

The authors declare no conflict of interest.

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