Volume 204, Issue 8 pp. 2760-2765
Original Paper

Synchrotron-radiation computed laminography for high-resolution three-dimensional imaging of flat devices

Lukas Helfen

Corresponding Author

Lukas Helfen

ANKA/Institute for Synchrotron Radiation, Forschungszentrum Karlsruhe, Germany

University of Karlsruhe, Germany

Phone: +33 476 88 2558, Fax: +33 476 88 2252Search for more papers by this author
Anton Myagotin

Anton Myagotin

ANKA/Institute for Synchrotron Radiation, Forschungszentrum Karlsruhe, Germany

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Alexander Rack

Alexander Rack

ANKA/Institute for Synchrotron Radiation, Forschungszentrum Karlsruhe, Germany

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Petra Pernot

Petra Pernot

ANKA/Institute for Synchrotron Radiation, Forschungszentrum Karlsruhe, Germany

European Synchrotron Radiation Facility, Grenoble, France

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Petr Mikulík

Petr Mikulík

Department of Condensed Matter Physics, Masaryk University, Brno, Czech Republic

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Marco Di Michiel

Marco Di Michiel

European Synchrotron Radiation Facility, Grenoble, France

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Tilo Baumbach

Tilo Baumbach

ANKA/Institute for Synchrotron Radiation, Forschungszentrum Karlsruhe, Germany

University of Karlsruhe, Germany

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First published: 31 July 2007
Citations: 56

Abstract

Synchrotron-radiation computed laminography (SRCL) is developed as a method for high-resolution three-dimensional (3D) imaging of regions of interest (ROIs) in all kinds of laterally extended devices. One of the application targets is the 3D X-ray inspection of microsystems. In comparison to computed tomography (CT), the method is based on the inclination of the tomographic axis with respect to the incident X-ray beam by a defined angle. With the microsystem aligned roughly perpendicular to the rotation axis, the integral X-ray transmission on the two-dimensional (2D) detector does not change exceedingly during the scan. In consequence, the integrity of laterally extended devices can be preserved, what distinguishes SRCL from CT where ROIs have to be destructively extracted (e.g. by cutting out a sample) before being imaged. The potential of the method for three-dimensional imaging of microsystem devices will be demonstrated by examples of flip-chip bonded and wire-bonded devices. (© 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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