Volume 197, Issue 1 pp. 246-250
Original Paper

Thermal analysis of hydrosilylation of 1-dodecene on porous silicon surface

J. SalonenE. Laine

E. Laine

Department of Physics, University of Turku, FIN-20014 Turku, Finland

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L. Niinistö

L. Niinistö

Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, FIN-02015 Espoo, Finland

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First published: 30 April 2003
Citations: 12

Abstract

Hydrosilylation of 1-dodecene on porous silicon surface has been studied by calorimetric methods. Using unpurified and purified 1-dodecene, it was possible to distinguish the reactions arising from oxidation from those due to hydrosilylation reactions. A surprising change from an exothermic reaction to an endothermic one was observed above 130 °C. A possible origin for this has been proposed, based on breaking of the double bond in the 1-dodecene molecule leaving CHx-termination on the PSi surface. The density functional calculations and measured FTIR spectra are presented as supporting evidence for the explanation given.

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