Volume 28, Issue 12 pp. 3387-3402
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The effect of power on the plasma-assisted deposition of fluorinated monomers

R. d'Agostino

R. d'Agostino

C.N.R.–Centro di Studio per la Chimica dei Plasmi, Department of Chemistry, University of Bari, 4, Trav. 200 Re David, 70126 Bari, Italy

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P. Favia

P. Favia

C.N.R.–Centro di Studio per la Chimica dei Plasmi, Department of Chemistry, University of Bari, 4, Trav. 200 Re David, 70126 Bari, Italy

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F. Fracassi

Corresponding Author

F. Fracassi

C.N.R.–Centro di Studio per la Chimica dei Plasmi, Department of Chemistry, University of Bari, 4, Trav. 200 Re David, 70126 Bari, Italy

C.N.R.-Centro di Studio per la Chimica dei Plasmi, Department of Chemistry, University of Bari, 4, Trav. 200 Re David, 70126 Bari, ItalySearch for more papers by this author
F. Illuzzi

F. Illuzzi

Central R&D SGS, THOMSON Microelectronics, via Olivetti 2, 20041 Agrate Brianza (MI), Italy

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First published: November 1990
Citations: 34

Abstract

The effect of power variation on the polymerization kinetics and on the polymer structure is reported for RF glow discharges fed with C2F6–H2 mixtures. Both deposition rate and polymer structure trends can be correlated to the variations of gas-phase species density (atoms, radicals, and charged species) and can be explained by considering the competition of the deposition and etching process.

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