Microwave and Optical Technology Letters

Microwave cavity resonators using hard X-ray lithography

Z. Ma

TRLabs, 111–116 Research Drive, Saskatoon, Saskatchewan, Canada, S7N 3R3

Department of Electrical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, Saskatchewan, Canada, S7N 5A9

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D. M. Klymyshyn,

D. M. Klymyshyn

TRLabs, 111–116 Research Drive, Saskatoon, Saskatchewan, Canada, S7N 3R3

Department of Electrical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, Saskatchewan, Canada, S7N 5A9

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S. Achenbach,

S. Achenbach

TRLabs, 111–116 Research Drive, Saskatoon, Saskatchewan, Canada, S7N 3R3

Department of Electrical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, Saskatchewan, Canada, S7N 5A9

Institute for Microstructure Technology (IMT), Forschungszentrum Karlsruhe, Germany

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J. Mohr,

J. Mohr

Institute for Microstructure Technology (IMT), Forschungszentrum Karlsruhe, Germany

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Z. Ma,

Z. Ma

TRLabs, 111–116 Research Drive, Saskatoon, Saskatchewan, Canada, S7N 3R3

Department of Electrical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, Saskatchewan, Canada, S7N 5A9

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D. M. Klymyshyn,

D. M. Klymyshyn

TRLabs, 111–116 Research Drive, Saskatoon, Saskatchewan, Canada, S7N 3R3

Department of Electrical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, Saskatchewan, Canada, S7N 5A9

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S. Achenbach,

S. Achenbach

TRLabs, 111–116 Research Drive, Saskatoon, Saskatchewan, Canada, S7N 3R3

Department of Electrical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, Saskatchewan, Canada, S7N 5A9

Institute for Microstructure Technology (IMT), Forschungszentrum Karlsruhe, Germany

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J. Mohr,

J. Mohr

Institute for Microstructure Technology (IMT), Forschungszentrum Karlsruhe, Germany

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First published: 26 September 2005

https://doi.org/10.1002/mop.21168

Citations: 2

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Abstract

The performance of high-Q cavity resonators at microwave frequency using the LIGA micro-fabrication process is investigated. This technique enables the formation of deep-cavity structures with highly vertical and optically smooth sidewalls, leading to potentially high Q. The simulations show promising Q improvement, as compared to silicon structures using micromachining and wafer stacking, especially at higher frequencies. The feasibility of obtaining such cavities with hard X-ray lithography (XRL) is demonstrated. © 2005 Wiley Periodicals, Inc. Microwave Opt Technol Lett 47: 353–357, 2005; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.21168

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Volume47, Issue4

20 November 2005

Pages 353-357

Microwave cavity resonators using hard X-ray lithography

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Microwave cavity resonators using hard X-ray lithography

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