Volume 307, Issue 9 2200291
Research Article

Achieving Hydrophobic Ultralow Dielectric Constant Polyimide Composites: Combined Efforts of Fluorination and Porous Fillers

Wanjing Zhao

Wanjing Zhao

Key Laboratory of Polymer Processing Engineering of Ministry of Education, Guangdong Provincial Key Laboratory of Technique and Equipment for Macromolecular Advanced Manufacturing, School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou, 510640 P. R. China

Search for more papers by this author
Chonghao Lu

Chonghao Lu

Key Laboratory of Polymer Processing Engineering of Ministry of Education, Guangdong Provincial Key Laboratory of Technique and Equipment for Macromolecular Advanced Manufacturing, School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou, 510640 P. R. China

Search for more papers by this author
Hui Zhao

Hui Zhao

School of Chemistry and Chemical Engineering, College of Light Industry and Food Engineering, Guangxi University, Nanning, 530004 P. R. China

Search for more papers by this author
Jingshu Huang

Jingshu Huang

Key Laboratory of Polymer Processing Engineering of Ministry of Education, Guangdong Provincial Key Laboratory of Technique and Equipment for Macromolecular Advanced Manufacturing, School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou, 510640 P. R. China

Search for more papers by this author
Jun-Wei Zha

Jun-Wei Zha

School of Chemistry and Biological Engineering, University of Science & Technology Beijing, Beijing, 100083 P. R. China

Shunde Graduate School of University of Science and Technology Beijing, Shunde, 528399 P. R. China

Search for more papers by this author
Xianwu Cao

Corresponding Author

Xianwu Cao

Key Laboratory of Polymer Processing Engineering of Ministry of Education, Guangdong Provincial Key Laboratory of Technique and Equipment for Macromolecular Advanced Manufacturing, School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou, 510640 P. R. China

E-mail: [email protected]; [email protected]; [email protected]

Search for more papers by this author
Robert K. Y. Li

Robert K. Y. Li

Department of Materials Science and Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong SAR, 999077 P. R. China

Search for more papers by this author
Wei Wu
First published: 31 May 2022
Citations: 5

Abstract

The advancement of the microelectronics industry necessitates the use of interlayer insulation materials with low dielectric constants and high mechanical properties. In this paper, a new type of copolymerized fluorinated polyimide (PI) is synthesized, and mixed with polyhedral oligomeric silsesquioxane (POSS) functionalized mesoporous silica (MCM-41@POSS). The PI/MCM-41@POSS composites exhibit good hydrophobicity. With the addition of 3 wt% MCM-41@POSS, the PI composite attained an ultralow dielectric constant (k = 1.88) and low dielectric loss (0.01) at 1 MHz, which is attributed to the mesoporous structure of MCM-41 and the restriction of polarization in the bonded region. The decorated POSS effectively prevents the penetration of PI molecular chains into the mesopores of MCM-41. In addition, the PI composites containing 3 wt% of MCM-41@POSS obtain the highest maximum stress of 104.03 MPa with an elongation at break of 13.73%. The hydrophobic PI composites with ultralow-k are expected to be good candidates as interlayer materials in microelectronics devices.

Conflict of Interest

The authors declare no conflict of interest.

Data Availability Statement

Research data are not shared.

The full text of this article hosted at iucr.org is unavailable due to technical difficulties.