Rewritable ITO Patterning for Nanophotonics
Xinqin Liu
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorPan Peng
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorZhenyang Zhang
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorXiangyu Zhao
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorWenyu Chen
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorShiyuan Liu
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Research Institute of Huazhong University of Science and Technology Shenzhen, Optics Valley Laboratory, Wuhan, 430074 China
Search for more papers by this authorCorresponding Author
Jinlong Zhu
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Research Institute of Huazhong University of Science and Technology Shenzhen, Optics Valley Laboratory, Wuhan, 430074 China
E-mail: [email protected]
Search for more papers by this authorXinqin Liu
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorPan Peng
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorZhenyang Zhang
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorXiangyu Zhao
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorWenyu Chen
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
Search for more papers by this authorShiyuan Liu
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Research Institute of Huazhong University of Science and Technology Shenzhen, Optics Valley Laboratory, Wuhan, 430074 China
Search for more papers by this authorCorresponding Author
Jinlong Zhu
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074 China
State Key Laboratory of Intelligent Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Research Institute of Huazhong University of Science and Technology Shenzhen, Optics Valley Laboratory, Wuhan, 430074 China
E-mail: [email protected]
Search for more papers by this authorAbstract
Nanophotonic devices leverage unique interactions between photons and materials at the nanoscale, enabling applications in optical communication, biosensing, and quantum computing. These devices' properties are susceptible to material composition and structural design. Nanofabrication techniques, such as optical lithography, e-beam lithography, two-photon polymerization, and direct laser writing, have been widely applied to fabricate nanophotonic devices. Notably, rewritable fabrication stands out due to its low cost, flexibility, efficiency, and multi-functionality. In this paper, a novel rewritable nanofabrication technique is proposed, which combines electrochemical reactions with direct laser writing, to fabricate nanophotonic devices on low-cost indium tin oxide (ITO) films. The experimental results have demonstrated that high-quality and erasable photonic structures such as diffraction gratings and holography masks can be directly fabricated using our technique. Hence, it is believed that this method can be applied in diverse fields such as nanophotonics, optoelectronic devices, biosensors, micro-electromechanical systems, and nonlinear optics.
Conflict of Interest
The authors declare no conflict of interest.
Open Research
Data Availability Statement
The data that support the findings of this study are available from the corresponding author upon reasonable request.
Supporting Information
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| lpor202401799-sup-0001-SuppMat.docx2.7 MB | Supporting Information |
Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
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