Electronics and Communications in Japan (Part II: Electronics)

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Polymer thin film waveguide polarizer with a-Si: H clad

Isamu Kato

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School of Science and Engineering, Waseda University, Tokyo, Japan 160

Isamu Kato graduated from Waseda University, Dept. of Electronic Communication Engineering in 1967 and obtained his doctoral degree in 1972. In 1973, he joined the faculty of Waseda University. He is a member of Institute of Electrical Engineers of Japan; Applied Physics Society; Television Society; Japan Vacuum Society; and IEEE.

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Yasuyuki Sugiyama,

Yasuyuki Sugiyama

Member

School of Science and Engineering, Waseda University, Tokyo, Japan 160

Yasuyuki Sugiyama graduated from Waseda University, Dept. of Electronic Communication Engineering in 1985 and obtained his M.S. in 1987. He then joined Nippon Telegraph and Telephone. While in graduate school, he was engaged in research on multilayered thin-film optical circuit elements. He is a member of the Applied Physics Society.

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Kotaro Sugita,

Kotaro Sugita

Nonmember

School of Science and Engineering, Waseda University, Tokyo, Japan 160

Kotaro Sugita graduated from Waseda University, Dept. of Electronic Communication Engineering in 1987. Presently, he is working toward his M.S. degree. He has been engaged in research on multilayered thin-film optical circuit elements. He is a member of the Applied Physics Society; and the Television Society.

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Isamu Kato,

Isamu Kato

Member

School of Science and Engineering, Waseda University, Tokyo, Japan 160

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Yasuyuki Sugiyama,

Yasuyuki Sugiyama

Member

School of Science and Engineering, Waseda University, Tokyo, Japan 160

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Kotaro Sugita,

Kotaro Sugita

Nonmember

School of Science and Engineering, Waseda University, Tokyo, Japan 160

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First published: 1988

https://doi.org/10.1002/ecjb.4420711205

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Abstract

A device has been fabricated by loading an a-Si:H film on a polymer thin-film optical waveguide via a low index buffer layer. As an application to an optical functional device, this structure has been investigated as to its characteristics as a TE-TM mode waveguide polarizer. In the present waveguide polarizer, the transmission mode can be selected by varying the thickness of the a-Si:H film. In addition to the TE mode pass polarizer, a TM mode pass polarizer has been fabricated and studied which is not easily realized with a metal loaded structure. Both a slab waveguide and a practically important three-dimensional waveguide (width 100 μm, 50 μm, 10 μm and 5 μm) have been used. In the case of a slab waveguide, both the TE mode and TM mode pass polarizers have exhibited an extinction ratio of 30 dB. In the case of a three-dimensional waveguide, the extinction ratio is somewhat lower because the electric field distribution of the guided mode is a hybrid of the TE and TM modes. Nevertheless, the polarizer has a good extinction ratio.

References

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Volume71, Issue12

1988

Pages 39-45

Polymer thin film waveguide polarizer with a-Si: H clad

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Polymer thin film waveguide polarizer with a-Si: H clad

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