ChemInform Abstract: A Kinetic Study of the Reaction of Copper Atoms in the Gas Phase with Molecular Oxygen at 300 K in Microwave-Induced Plasma Afterglows.
Abstract
The title reaction, depicted in the scheme, is investigated at 300 K and in the pressure range 5.5-12 torr using the novel experimental technique of plasma afterglow atomization of CuCl and Cu(OAc)2 in H2/Ar microwave-induced plasmas.
ChemInform Abstract
The title reaction, depicted in the scheme, is investigated at 300 K and in the pressure range 5.5-12 torr using the novel experimental technique of plasma afterglow atomization of CuCl and Cu(OAc)2 in H2/Ar microwave-induced plasmas. The Cu atoms are detected by AAS. The rate constant is found to be 3.8·10-31 cm6 molecule-2 s-1at 300 K. The diffusion coefficient DCu,Ar = 219.9 cm2 torr s-1at 300 K is also derived. It is concluded that this new method for generation of gas-phase atoms of non-volatile metals at low temp. opens new perspectives in the field of kinetic studies of metal atom-gas reactions.
