Volume 47, Issue 6 pp. 1057-1064
Article
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Temperature effect on PI/Cu interface

Tsung-Hsiung Wang

Tsung-Hsiung Wang

Industrial Technology Research Institute, Materials Research laboratories, Chutung, Hsinchu, Taiwan, R.O.C.

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Shy-Ming Ho

Shy-Ming Ho

Industrial Technology Research Institute, Materials Research laboratories, Chutung, Hsinchu, Taiwan, R.O.C.

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Ker-Ming Chen

Ker-Ming Chen

Industrial Technology Research Institute, Materials Research laboratories, Chutung, Hsinchu, Taiwan, R.O.C.

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Aina Hung

Corresponding Author

Aina Hung

Department of Chemical Engineering, Ming-Hsin Engineering College, Hsin-Feng, Hsinchu, Taiwan, R.O.C.

Department of Chemical Engineering, Ming-Hsin Engineering College, Hsin-Feng, Hsinchu, Taiwan, R.O.C.===Search for more papers by this author
First published: 10 February 1993
Citations: 4

Abstract

The interfacial reaction and peel strength of polyimide with copper foil at various cure schedules have been investigated by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), and peel test to determine the temperature effect on polyimide/copper interface diffusion and adhesion. SEM studies indicate that the polyimide/copper interfaces are fairly smooth for all samples studied in this experiment. The TEM microstructure reveals the existence of a copper-polyimide interaction zone at the interface when it is cured at a temperature higher than 250°C, which also results in a high peel strength. XPS spectra revealed higher copper and carbonyl carbon contents at the polyimide interface when it is cured at a high-temperature schedule (350°C). From the results of these interface studies, it is concluded that chemical bonding resulting from the interaction of copper oxide and polyimide carbonyl group provides the binding force for polyimide and copper foil. © 1993 John Wiley & Sons, Inc.

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