Redox-Active Organometallic Vesicles: Aqueous Self-Assembly of a Diblock Copolymer with a Hydrophilic Polyferrocenylsilane Polyelectrolyte Block†
K. Nicole Power-Billard
Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario, M5S 3H6, Canada, Fax: (+1) 416-978-6157
Search for more papers by this authorRichard J. Spontak Prof.
Departments of Chemical Engineering and Materials Science & Engineering, North Carolina State University, Raleigh, NC 27695, USA, Fax: (+1) 919-515-3465
Search for more papers by this authorIan Manners Prof.
Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario, M5S 3H6, Canada, Fax: (+1) 416-978-6157
Search for more papers by this authorK. Nicole Power-Billard
Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario, M5S 3H6, Canada, Fax: (+1) 416-978-6157
Search for more papers by this authorRichard J. Spontak Prof.
Departments of Chemical Engineering and Materials Science & Engineering, North Carolina State University, Raleigh, NC 27695, USA, Fax: (+1) 919-515-3465
Search for more papers by this authorIan Manners Prof.
Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario, M5S 3H6, Canada, Fax: (+1) 416-978-6157
Search for more papers by this authorI.M. thanks the Canadian Government for a Canada Research Chair and would like to thank the Natural Sciences and Engineering Research Council (NSERC) for support. R.J.S. thanks the STC Program of the National Science Foundation under Agreement No. CHE-9876674 for support. Special thanks to Mr. Fred Pearson at McMaster University for the TEM analysis of LN2-quenched solutions of polymer 4. We thank Alex Bartole-Scott and John Halfyard for performing the electrochemistry experiments.
Graphical Abstract
A water-soluble poly(dimethylsiloxane-b-ferrocenylsilane) diblock copolymer containing a hydrophilic cationic polyferrocene block, which is formed in a self-assembly process, yields redox-active vesicles with a diameter of approximately 85 nm (see figure) in which the organometallic block is located on both the outside and the inside of the formed aggregates.
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