Microwave Field Attenuation Length and Half‐Power Depth in Magnetic Materials - 2nd International Symposium on High‐Temperature Metallurgical Processing - Wiley Online Library

Microwave Field Attenuation Length and Half-Power Depth in Magnetic Materials

Zhiwei Peng,

Zhiwei Peng

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Jiann-Yang Hwang,

Jiann-Yang Hwang

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Xiaodi Huang,

Xiaodi Huang

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Matthew Andriese,

Matthew Andriese

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Wayne Bell,

Wayne Bell

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Zhiwei Peng,

Zhiwei Peng

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Jiann-Yang Hwang,

Jiann-Yang Hwang

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Xiaodi Huang,

Xiaodi Huang

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Matthew Andriese,

Matthew Andriese

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Wayne Bell,

Wayne Bell

Department of Materials Science and Engineering, Michigan Technological University, Houghton, MI 49931, USA

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Book Editor(s):Jiann-Yang Hwang,

Jiann-Yang Hwang

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Jaroslaw Drelich,

Jaroslaw Drelich

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Jerome Downey,

Jerome Downey

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Tao Jiang,

Tao Jiang

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Mark Cooksey,

Mark Cooksey

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First published: 28 February 2011

https://doi.org/10.1002/9781118062081.ch7

Summary

This chapter contains sections titled:

Introduction
Derivation of Field Attenuation Length and Half-power Depth Equations
Determination of Field Attenuation Length and Half-power Depth
Conclusions
Acknowledgements

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2nd International Symposium on High‐Temperature Metallurgical Processing