Volume 191, Issue 2 pp. 613-620
Original Paper

Temperature Dependence of the Absorption Coefficient in 4H- and 6H-Silicon Carbide at 355 nm Laser Pumping Wavelength

A. Galeckas

A. Galeckas

Solid State Electronics, Royal Institute of Technology, Electrum 229, Kista-Stockholm, SE-164 40 Sweden

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P. Grivickas

P. Grivickas

Solid State Electronics, Royal Institute of Technology, Electrum 229, Kista-Stockholm, SE-164 40 Sweden

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V. Grivickas

V. Grivickas

Institute of Materials Science and Applied Research, Vilnius University, Saulėtekio 10, Vilnius, LT-2040 Lithuania

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V. Bikbajevas

V. Bikbajevas

Institute of Materials Science and Applied Research, Vilnius University, Saulėtekio 10, Vilnius, LT-2040 Lithuania

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J. Linnros

J. Linnros

Solid State Electronics, Royal Institute of Technology, Electrum 229, Kista-Stockholm, SE-164 40 Sweden

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Abstract

We report on the absorption coefficient at 355 nm laser wavelength for 4H- and 6H-SiC over a wide temperature range. The measurements were carried out using a depth- and time-resolved free-carrier-absorption technique. The values of the absorption coefficient for the fundamental Eĉ and Eĉ light polarization were extracted from the instantaneous profiles of the excess carrier concentration. The absorption dependency in 4H epilayers is consistent with a model based on the indirect optical transitions and shift of the energy gap with temperature. A discrepancy in absorption observed in heavily-doped 4H-SiC substrates at elevated temperatures is associated with a doping-induced narrowing of the band gap.

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