Surface and Thin-Film Analysis, 4 Photon Detection

Roderich Raue

Roderich Raue

Bayer AG, Leverkusen, Germany

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Klaus Kunde

Klaus Kunde

Bayer AG, Leverkusen, Germany

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Aloys Engel

Aloys Engel

DyStar Textilfarben GmbH & Co. Deutschland KG, Leverkusen, Germany

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First published: 15 October 2011

Abstract

The article contains sections titled:

1.

Total-Reflection X-ray Fluorescence Analysis (TXRF)

1.1.

Principles

1.2.

Instrumentation

1.3.

Spectral Information

1.4.

Quantification

1.5.

Applications

1.5.1.

Particulate and Film-Type Surface Contamination

1.5.2.

Semiconductors

1.5.2.1.

Depth Profiling by TXRF and Multilayer Structures

1.5.2.2.

Vapor Phase Decomposition (VPD) and Droplet Collection

2.

Glow Discharge Optical Emission Spectroscopy (GD-OES)

2.1.

Principles

2.2.

Instrumentation

2.3.

Spectral Information

2.4.

Quantification

2.5.

Depth Profiling

2.6.

Applications

3.

Surface-Sensitive IR and Raman Spectroscopy; Ellipsometry

3.1.

Reflection - Absorption IR Spectroscopy (RAIRS)

3.1.1.

Principles

3.1.2.

Instrumentation and Applications

3.2.

Surface Raman Spectroscopy

3.2.1.

Principles

3.2.2.

Surface-Enhanced Raman Scattering (SERS)

3.2.2.1.

Instrumentation

3.2.2.2.

Spectral Information

3.2.2.3.

Applications

3.2.3.

Nonlinear Optical Spectroscopy

3.3.

UV - VIS - IR Ellipsometry (ELL)

3.3.1.

Principles

3.3.2.

Instrumentation

3.3.3.

Applications

4.

Other Photon-Detecting Techniques

4.1.

Appearance-Potential Methods

4.1.1.

Soft X-Ray Appearance-Potential Spectroscopy (SXAPS)

4.1.2.

Disappearance-Potential Spectroscopy (DAPS)

4.2.

Inverse Photoemission Spectroscopy (IPES) and Bremsstrahlung Isochromat Spectroscopy (BIS)

4.3.

Ion-Beam Spectrochemical Analysis (IBSCA)

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