Semiconductor Factory Control and Optimization

Stephanie Watts Butler

Stephanie Watts Butler

Texas Instruments, Dallas, TX

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Rudy York

Rudy York

Texas Instruments, Dallas, TX

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Marylyn Hoy Bennett

Marylyn Hoy Bennett

Texas Instruments, Dallas, TX

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Tom Winter

Tom Winter

Texas Instruments, Dallas, TX

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First published: 27 December 1999
Citations: 1

Abstract

The sections in this article are

  • 1 Control in Breadth
  • 2 Generic Model of the Elements of a Controller
  • 3 Control in Depth
  • 4 Change Management
  • 5 Statistical Process Control
  • 6 Run-to-Run Model-Based Process Control
  • 7 Equipment Signal Monitoring, Real-Time Fault Detection and Classification
  • 8 Sensors
  • 9 In Situ Particle Monitors
  • 10 In-Line Defect Monitoring and Contamination Control
  • 11 Wafer Position Tracking
  • 12 Data Mining and Data Warehousing
  • 13 Parametric and Yield Outlier Control
  • 14 Wafer Level Reliability Control
  • 15 Multivariate SPC, Especially for Equipment Signal Monitoring
  • 16 Acknowledgments

The full text of this article hosted at iucr.org is unavailable due to technical difficulties.