The conductive behavior and structural characteristics in the I+-beam-implanted layer of plasma-polymerized pyrrole film
First published: 07 December 1998
Citations: 3
Abstract
A dense organic film was prepared by plasma polymerization of pyrrole. A 20 keV I+ implantation at a fluence of 1 × 1016 ions cm−2 was used to produce a conducting surface layer due to doping. The characteristics of the implanted layer have been investigated using ion beam analysis techniques, X-ray photoelectron spectroscopy, and near-infrared to ultraviolet spectroscopy. The charge carriers transport in this implanted layer was also analyzed in the temperature region of 120 to 297 K. © 1998 John Wiley & Sons, Inc. J. Appl. Polym. Sci. 69: 1743–1751, 1998
